百灵威科技
富勒烯-N,N-二甲基吡咯鎓碘盐, C60-N,N-Dimethylpyrrolidinium iodide
[6,6]-苯基-C61-丁酸乙酯, [6,6]-Phenyl-C61 butyric acid ethyl ester
氯吡嘧磺隆, Halosulfuron-methyl
1,4-双(4-(2-甲基丙烯酰氧基乙基)苯基氨基)蒽醌, 2-[4-[[4-[4-[2-(2-Methylprop-2-enoyloxy)ethyl]anilino]-9,10-dioxoanthracen-1-yl]amino]phenyl]ethyl 2-methylprop-2-enoate
聚{[N,N′-双(2-辛基十二烷基)苯并[LMN][3,8]邻二氮杂菲-1,3,6,8 (2H,7H)-四酮-4,9-二基)([2,2′]二噻吩基-5,5′-二基)}, Poly[[1,2,3,6,7,8-hexahydro-2,7-bis(2-octyldodecyl)-1,3,6,8-dioxobenzo[lmn][3,8]phenanthroline-4,9-diyl][2,2'-bithiophene]-5,5'-diyl]
N-acetyltyramine
N-乙酰基酪胺
Thymol
百里酚
硅基磁珠, Silica magnetic beads, 800nm, 50mg/mL
脱氧唑-季碳型, Deoxazole-Quat
N,N-二苯基-4-(4,4,5,5-四甲基-1,3,2-二氧杂环戊硼烷-2-基)苯胺, N,N-Diphenyl-4-(4,4,5,5-tetramethyl-1,3,2-dioxaborolan-2-yl)aniline
3-(1-萘基)苯硼酸 (含不同量的酸酐), 3-(1-Naphthyl)phenylboronic Acid (contains varying amounts of Anhydride)
2,4-Dimethoxy-5-pyrimidylboronic Acid (contains varying amounts of Anhydride)
2,4-二甲氧基-5-嘧啶硼酸 (含不同量的酸酐)
2-(3-溴苯基)-4,4,5,5-四甲基-1,3,2-二氧杂环戊硼烷, 2-(3-Bromophenyl)-4,4,5,5-tetramethyl-1,3,2-dioxaborolane
弯抱霉菌素, (S)-Curvularin
Diaion WA30 游离碱, Diaion WA30 free base